MATERIALS AND NANOSTRUCTURES LABORATORY

The specific training objectives of this course are related to three aspects: 1) synthesis, 2) processing, and 3) characterization of materials and nanostructures, as well as the processing and analysis of experimental data.

In particular:

1)   Synthesis

• Understanding of the physical phenomena (thermodynamic and kinetic) underlying the formation of materials and nanostructures;

• Acquisition of knowledge and skills in the preparation of materials and nanostructures in the context of recent developments;

• Basic knowledge of the principles of operation of scientific instrumentation for the synthesis of materials and nanostructures (vapor phase deposition techniques, liquid phase deposition techniques).

2)   Processing

• Understanding of the physical phenomena (thermodynamic and kinetic) underlying the morphological/structural evolution of materials and nanostructures induced by post-synthesis processes (thermal processes, ion irradiation);

• Basic knowledge of the principles of operation of scientific instrumentation for morphological/structural modification of materials and nanostructures (furnaces, ion implantation).

3)   Characterization and processing of experimental data

• Understanding of the physical phenomena underlying the morphological, structural, compositional, and electronic characterization of materials and nanostructures;

• Acquisition of knowledge and skills in the characterization of materials and nanostructures in the context of recent developments;

• Basic knowledge of the principles of operation of scientific instrumentation for the characterization of materials and nanostructures (scanning electron microscopy, Rutherford backscattering spectrometry, electrochemical analysis);

• Acquisition of autonomy and critical capacity in processing experimental data (accurate evaluation of experimental errors and sensitivity of different analytical techniques) and the ability to produce a scientific report (text document or presentation) summarizing an experimental procedure and critically illustrating the results obtained.

Furthermore, regarding the so-called Dublin Descriptors, the course aims to provide the following knowledge and side skills:

Knowledge and understanding abilities:

• Critical understanding of recent developments in Modern Physics, both theoretical and experimental, and their interrelationships across different subjects;

• Mastery of the scientific method, understanding the nature and methods of research in Physics.

Applying knowledge and understanding ability:

• Ability to identify the essential elements of a phenomenon in terms of orders of magnitude and level of approximation, and the ability to perform necessary approximations;

• Ability to use analogy as a tool to apply known solutions to new problems (problem-solving);

• Ability to plan and apply experimental and theoretical procedures to solve problems in academic or applied research, or to improve existing results;

• Ability to use analytical and numerical tools, or scientific computing, including software development.

Ability of making judgements:

• Awareness of safety issues in laboratory activities;

• Ability to argue one’s interpretations of physical phenomena during discussions within a research team.

Communication skills:

• Ability to discuss advanced physical concepts, both in Italian and English;

• Ability to present one’s research activity or a research topic to both expert and non-expert audiences.

Learning skills:

• Ability to acquire appropriate tools for continuous updating of one’s knowledge;

• Ability to access specialized literature in both the specific field of expertise and closely related fields;

• Ability to leverage databases and bibliographic and scientific resources to extract information and suggestions for better framing and developing one’s study and research activity.

Lectures: 3 ECTS for a total of 21 hours

Laboratory activities: 3 ECTS for a total of 45 hours

It is preferable to have acquired basic knowledge of Solid State Physics, Semiconductor Physics, and Materials Science.

Attendance is usually mandatory.

A) Synthesis

A.1) Theoretical lectures

General introduction to vapor phase and liquid phase deposition techniques of thin films and nanostructures on substrates, including sputtering, evaporation, molecular beam epitaxy, chemical vapor deposition, atomic layer deposition, chemical bath deposition, hydrothermal deposition, and electrochemical deposition techniques.

Sputtering deposition of thin films and nanostructures on substrates: kinetic and thermodynamic physical principles, deposition parameters, experimental apparatus.

A.2) Laboratory activities

Deposition of thin films on substrates using the sputtering technique.

Deposition of nanostructures from chemical baths.

B) Processing

B.1) Theoretical lectures

General introduction to the processes and basic physical parameters involved in the evolution of materials and nanostructures subjected to thermal processes and ion implantation/irradiation.

B.2) Laboratory activities

Thermal processes of thin films or nanostructures deposited on substrates.

Ion implantation/irradiation of thin films or nanostructures.

C) Characterization and processing of experimental data

C.1) Theoretical lectures

Scanning electron microscopy: basic principles, electron-matter interaction, experimental apparatus.

Rutherford backscattering spectrometry (RBS): collision kinematics, cross-section, energy loss, experimental apparatus.

Physical interpretation and characterization of metal/liquid and semiconductor/liquid interfaces using electrochemical techniques, including charge transfer resistance, flat band potential, and dopant concentration measurements, experimental apparatus.

C.2) Laboratory activities

Analysis of thin films and nanostructures on substrates using scanning electron microscopy; use of software for data and image analysis.

Acquisition and analysis of RBS spectra of thin films or nanostructures using appropriate software (RUMP and/or SimNRA).

Measurement of the properties of metal/liquid and semiconductor/liquid interfaces using various electrochemical techniques, including electrochemical impedance spectroscopy and Mott-Schottky analysis.

Processing and analysis of experimental data.

1.    P. M. Martin, Handbook of Deposition Technologies for Films and Coatings-Science, Applications, Technology, Elsevier 2005

2.    K. Wasa, M. Kitabatake, H. Adachi, Thin Film Materials Technology-Sputtering of Compound Materials, William Andrew Publishing 2004

3.    K. B. Oldham and J. C. Myland, “Fundamentals of Electrochemical Science” Academic Press

4.    L. Feldman, J. Mayer “Fundamentals of Surface and Thin Film Analysis” North-Holland Ed.

5.    K.-N. Tu, J. W. Mayer, L. C. Feldman, “Electronic Thin Film Science” Macmillan Publishing Company

6.    E. Rimini, “Ion Implantation: Basics to Device Fabrication”, Springer

7.    L. Reimer, Scanning Electron Microscopy- Physics of Image Formation and Microanalysis, Springer 1998

8.    J. I. Goldstein et al., Scanning Electron Microscopy and X-ray Microanalysis, Springer 2018

The final exam consists of a presentation prepared and discussed by the student on one of the experiments in the course (student’s choice). Specifically, the student must present the experimental method and results related to the synthesis, process, and characterization of a nanostructure. Questions on all topics covered in the program may be asked during the presentation discussion.

The final grade will be equally influenced by the mastery demonstrated in qualitative and quantitative arguments and the critical analysis of the presented experimental results.

The assessment of learning can also be conducted remotely if conditions require it.

Physical principles of ion-matter interaction

Physical principles and technical characteristics underlying vapor-phase deposition processes of thin films with particular reference to the sputtering process

Principles and technical characteristics underlying liquid-phase deposition processes of nanostructures

Physical principles of electron-matter interaction

Physical principles and technical characteristics of scanning electron microscopy

Physical principles and technical characteristics of Rutherford backscattering spectrometry

Principles and technical characteristics underlying electrochemical measurements of the properties of thin films and nanostructures based on metals and/or semiconductors in liquids