MATERIALS AND NANOSTRUCTURES LABORATORY: SYNTHESIS AND CHARACTERIZATION

The specific training objectives of this course are related to three aspects: 1) synthesis, 2) processing, and 3)characterization of materials and nanostructures, as well as the processing and analysis of experimental data.

In particular:

1) Synthesis

• Understanding of the physical phenomena (thermodynamic and kinetic) underlying the formation ofmaterials and nanostructures;

• Acquisition of knowledge and skills in the preparation of materials and nanostructures in the context ofrecent developments;

• Basic knowledge of the principles of operation of scientific instrumentation for the synthesis of materialsand nanostructures (vapor phase deposition techniques, liquid phase deposition techniques).

2) Processing

• Understanding of the physical phenomena (thermodynamic and kinetic) underlying themorphological/structural evolution of materials and nanostructures induced by post-synthesis processes(for example, thermal treatments);

• Basic knowledge of the principles of operation of scientific instrumentation for morphological/structuralmodification of materials and nanostructures.

3) Characterization and processing of experimental data

• Understanding of the physical phenomena underlying the morphological, structural, compositional, andelectronic characterization of materials and nanostructures;

• Acquisition of knowledge and skills in the characterization of materials and nanostructures in thecontext of recent developments;

• Basic knowledge of the principles of operation of scientific instrumentation for the characterization ofmaterials and nanostructures (scanning and transmission electron microscopy, X-ray diffraction,electrochemical analysis);

• Acquisition of autonomy and critical capacity in processing experimental data (accurate evaluation ofexperimental errors and sensitivity of different analytical techniques) and the ability to produce a scientific report (text document or presentation) summarizing an experimental procedure and criticallyillustrating the results obtained.

Furthermore, regarding the so-called Dublin Descriptors, the course aims to provide the following knowledgeand side skills:

Knowledge and understanding abilities:

• Critical understanding of recent developments in Modern Physics, both theoretical and experimental,and their interrelationships across different subjects;

• Mastery of the scientific method, understanding the nature and methods of research in Physics.

Applying knowledge and understanding ability:

• Ability to identify the essential elements of a phenomenon in terms of orders of magnitude and level ofapproximation, and the ability to perform necessary approximations;

• Ability to use analogy as a tool to apply known solutions to new problems (problem-solving);

• Ability to plan and apply experimental and theoretical procedures to solve problems in academic orapplied research, or to improve existing results;

• Ability to use analytical and numerical tools, or scientific computing, including software development.

Ability of making judgements:

• Awareness of safety issues in laboratory activities;

• Ability to argue one’s interpretations of physical phenomena during discussions within a research team.

Communication skills:

• Ability to discuss advanced physical concepts, both in Italian and English;

• Ability to present one’s research activity or a research topic to both expert and non-expert audiences.

Learning skills:

• Ability to acquire appropriate tools for continuous updating of one’s knowledge;

• Ability to access specialized literature in both the specific field of expertise and closely related fields;

• Ability to leverage databases and bibliographic and scientific resources to extract information andsuggestions for better framing and developing one’s study and research activity.

A) Synthesis

A.1) Theoretical lectures

General introduction to vapor phase and liquid phase deposition techniques of thin films andnanostructures on substrates, including sputtering, evaporation, molecular beam epitaxy, chemicalvapor deposition, atomic layer deposition, chemical bath deposition, hydrothermal deposition, andelectrochemical deposition techniques.

Sputtering deposition of thin films and nanostructures on substrates: kinetic and thermodynamicphysical principles, deposition parameters, experimental apparatus.

A.2) Laboratory activities

Deposition of thin films on substrates using the sputtering technique.

Synthesis of nanostructures by chemical bath deposition/chemical precipitation/hydrothermalmethod.

B) Processing

B.1) Theoretical lectures

General introduction to the processes and basic physical parameters involved in the evolution ofmaterials and nanostructures subjected to thermal processes.

B.2) Laboratory activities

Thermal processes of thin films or nanostructures deposited on substrates.

C) Characterization and processing of experimental data

C.1) Theoretical lectures

Scanning and transmission electron microscopy: basic principles, electron-matter interaction,experimental apparatus.

X-ray diffraction: basic principles, experimental apparatus, crystallography.

Physical interpretation and characterization of metal/liquid and semiconductor/liquid interfacesusing electrochemical techniques, including charge transfer resistance, flat band potential, anddopant concentration measurements, experimental apparatus.

C.2) Laboratory activities

Analysis of thin films and nanostructures on substrates using scanning and transmission electronmicroscopy; use of software for data and image analysis.

Analysis of images obtained through the electron microscope.

Measurement of the properties of metal/liquid and semiconductor/liquid interfaces using variouselectrochemical techniques, including electrochemical impedance spectroscopy and Mott-Schottkyanalysis.

Processing and analysis of experimental data.

1. P. M. Martin, Handbook of Deposition Technologies for Films and Coatings-Science, Applications,Technology, Elsevier 2005

2. K. Wasa, M. Kitabatake, H. Adachi, Thin Film Materials Technology-Sputtering of Compound Materials,William Andrew Publishing 2004

3. K. B. Oldham and J. C. Myland, “Fundamentals of Electrochemical Science” Academic Press

4. L. Feldman, J. Mayer “Fundamentals of Surface and Thin Film Analysis” North-Holland Ed.

5. K.-N. Tu, J. W. Mayer, L. C. Feldman, “Electronic Thin Film Science” Macmillan Publishing Company

6. L. Reimer, Scanning Electron Microscopy- Physics of Image Formation and Microanalysis, Springer 1998

7. J. I. Goldstein et al., Scanning Electron Microscopy and X-ray Microanalysis, Springer 2018

8. David B. Williams , C. Barry Carter, Transmission Electron Microscopy, Springer 2009

The assessment of learning can also be conducted remotely if conditions require it.

Physical principles of ion-matter interaction

Physical principles and technical characteristics underlying vapor-phase deposition processes of thin films withparticular reference to the sputtering process

Principles and technical characteristics underlying liquid-phase deposition processes of nanostructures

Physical principles of electron-matter interaction

Physical principles and technical characteristics of scanning or transmission electron microscopy

Principles and technical characteristics underlying electrochemical measurements of the properties of thin filmsand nanostructures based on metals and/or semiconductors in liquids